The University of Massachusetts Amherst

A Simple, Robust Route for Generating Unidirectionally Aligned, Nanoscopic Line Patterns of Block Copolymers over Arbitrarily Large Areas

LEAD INVENTOR:
Thomas P. Russell, Ph.D.
 
TECHNOLOGY DESCRIPTION
Researchers at UMass Amherst, UC Berkeley and Ulsan National Institute of Science and Technology have collaboratively developed a simple, robust route for producing unidirectionally aligned, nanoscopic line patterns of block copolymers over arbitrarily large areas, with an order parameter in excess of 0.97. The fabrication process combines the “bottom-up,” directed self-assembly of block copolymer approach to generation of nanoscopic surface structures with a unique strategy to guide perfect assembly of horizontally positioned nanocylindrical domains of block copolymers on non-defect-free substrates. In addition, the fabrication process does not require photolithography, e-beam lithography, or other processes employing a “top-down” patterning approach. The exceptional alignment is attainable either on reconstructed, faceted single crystal surfaces or on their replicas made with flexible, inexpensive polymeric materials. The block copolymer line patterns with perfect structural order over arbitrarily large areas can be used in subsequent roll-to-roll type pattern transfer and patterning processes and to serve as templates and scaffolds for the manufacture of a variety of addressable media and devices.
 
ADVANTAGES

  • Structural perfection: The ultra-high density arrays of block copolymer lines have crystallographic registry over arbitrarily large areas, enabling fabrication of truly addressable, macroscopic media.
  • High substrate versatility: Thin films of perfectly ordered nanoscopic line patterns can be formed on both hard/non-flexible faceted substrates and soft/flexible faceted substrates.
  • Simple and environmentally friendly process: The “bottom-up” fabrication process eliminates the use of environmentally unfriendly harsh chemicals required by “top-down,” lithographic patterning techniques.

 

APPLICATIONS

  • Magnetic storage media
  • Polarizing devices
  • Nanowire arrays or nanowire-based devices
ABOUT THE INVENTOR
Dr. Thomas P. Russell is the Silvio O. Conte Distinguished Professor of Polymer Science and Engineering and a member of the National Academy of Engineering. His research interests span the areas of polymer-based nanoscopic structures and interfacial nanoparticle assemblies, directed self-assembly processes, electrohydrodynamic instabilities in thin polymer films, surface and interfacial properties of polymers, and polymer morphology. Dr. Russell directs the Energy Frontier Research Center on Polymer-Based Materials for Harvesting Solar Energy at UMass Amherst, which carries out fundamental photovoltaic-oriented research using organic-based polymers and related materials.
AVAILABILITY:
Available for Licensing or Sponsored Research
DOCKET:
UMA 10-26
PATENT STATUS:
US Patents Issued: US 9,156,682 and US 9,718,094
Contact:
Nikki Hoang
Licensing Officer
University of Massachusetts
nikkihoang@research.umass.edu
Inventor(s):
Thomas Russell
Sung Woo Hong
Dong-Hyun Lee
Soojin Park
Ting Xu
Keywords: